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In situ infrared spectroscopy study of atomic layer deposition of high-κ metal oxide and metal on passivated silicon surfaces

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Title
In situ infrared spectroscopy study of atomic layer deposition of high-κ metal oxide and metal on passivated silicon surfaces
Name (ID = NAME001); (type = personal)
NamePart (type = family)
Dai
NamePart (type = given)
Min
DisplayForm
Min Dai
Role
RoleTerm (authority = RULIB)
author
Name (ID = NAME002); (type = personal)
NamePart (type = family)
Chabal
NamePart (type = given)
Yves
Affiliation
Advisory Committee
DisplayForm
Yves J. Chabal
Role
RoleTerm (authority = RULIB)
chair
Name (ID = NAME003); (type = personal)
NamePart (type = family)
Hinch
NamePart (type = given)
Jane
Affiliation
Advisory Committee
DisplayForm
Jane Hinch
Role
RoleTerm (authority = RULIB)
internal member
Name (ID = NAME004); (type = personal)
NamePart (type = family)
Haule
NamePart (type = given)
Kristjan
Affiliation
Advisory Committee
DisplayForm
Kristjan Haule
Role
RoleTerm (authority = RULIB)
internal member
Name (ID = NAME005); (type = personal)
NamePart (type = family)
Halkiadakis
NamePart (type = given)
Eva
Affiliation
Advisory Committee
DisplayForm
Eva Halkiadakis
Role
RoleTerm (authority = RULIB)
internal member
Name (ID = NAME006); (type = personal)
NamePart (type = family)
Frank
NamePart (type = given)
Martin
Affiliation
Advisory Committee
DisplayForm
Martin M. Frank
Role
RoleTerm (authority = RULIB)
outside member
Name (ID = NAME007); (type = corporate)
NamePart
Rutgers University
Role
RoleTerm (authority = RULIB)
degree grantor
Name (ID = NAME008); (type = corporate)
NamePart
Graduate School - New Brunswick
Role
RoleTerm (authority = RULIB)
school
TypeOfResource
Text
Genre (authority = marcgt)
theses
OriginInfo
DateCreated (qualifier = exact)
2008
DateOther (qualifier = exact); (type = degree)
2008-10
Language
LanguageTerm
English
PhysicalDescription
Form (authority = marcform)
electronic
InternetMediaType
application/pdf
InternetMediaType
text/xml
Extent
xv, 199 pages
Abstract
Atomic layer deposition (ALD) is a novel and promising film deposition method for microelectronics and many other areas with documented commercial success. Notable advantages include accurate thickness control and high conformality, all of which are particularly important for deep trenches, porous materials and nanoparticles.
The key elements of ALD including starting surfaces and precursors are investigated with in situ Fourier transform infrared spectroscopy, using a variety of starting surfaces: hydrogen-terminated Si (H/Si), oxidized Si, nitrided Si, and self-assembled monolayers (SAMs) grafted on H/Si surfaces. In particular, the formation of nitrided surfaces using thermal NH3 reaction with flat and vicinal H/Si(111) is studied and a mechanistic understanding is achieved with the aid of density functional theory calculation. An unexpected NH incorporated bridging structure is found at the dihydride step edge. The properties and stability of methyl and carboxylic groups terminated alkene-based SAMs grafted to H/Si(111) surface via direct Si-C bonds are also addressed. The carboxylic groups terminated SAM can be grafted without formation of interfacial SiO2. Moreover, the use of SiNx and SAM successfully minimizes the interfacial SiO2 during ALD process.
With a thorough understanding of the starting surfaces, the nature of ALD grown high-κ metal oxides and metal is studied. Water- and ozone-based ALD of HfO2 and Al2O3 are investigated mechanistically. Unexpected intermediate species and reaction pathways are found to depend on ozone partial pressure, such as formate intermediate for Al2O3 deposition.
La2O3 and Cu deposited by novel precursors, La(iPr-MeAMD)3/D2O and [Cu(sBu-amd)]2/H2 respectively, are explored in many aspects such as the nature of precursor gas phase, the ALD temperature window, the film properties, and so on. In all cases, a mechanistic picture of the surface interaction and film growth is unraveled using infrared spectroscopy and other complementary techniques, such as Rutherford back scattering spectroscopy and X-ray photoelectron spectroscopy. Gas phase studies show that the two precursors are both readily hydrolyzed and highly reactive. ALD-deposited La2O3 films are of poor quality due to the hygroscopic nature of La2O3, and Cu diffusion and agglomeration are inferred from the evolution of IR vibrational modes.
Note (type = degree)
Ph.D.
Note (type = bibliography)
Includes bibliographical references.
Subject (ID = SUBJ1); (authority = RUETD)
Topic
Physics and Astronomy
Subject (ID = SUBJ2); (authority = ETD-LCSH)
Topic
Thin films
Subject (ID = SUBJ3); (authority = ETD-LCSH)
Topic
Silicon--Surfaces
RelatedItem (type = host)
TitleInfo
Title
Graduate School - New Brunswick Electronic Theses and Dissertations
Identifier (type = local)
rucore19991600001
Identifier (type = hdl)
http://hdl.rutgers.edu/1782.2/rucore10001600001.ETD.17453
Identifier
ETD_1201
Location
PhysicalLocation (authority = marcorg); (displayLabel = Rutgers, The State University of New Jersey)
NjNbRU
Identifier (type = doi)
doi:10.7282/T3891667
Genre (authority = ExL-Esploro)
ETD doctoral
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RightsDeclaration (AUTHORITY = GS); (ID = rulibRdec0006)
The author owns the copyright to this work.
Copyright
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Copyright protected
Availability
Status
Open
AssociatedEntity (AUTHORITY = rulib); (ID = 1)
Name
Min Dai
Role
Copyright holder
Affiliation
Rutgers University. Graduate School - New Brunswick
RightsEvent (AUTHORITY = rulib); (ID = 1)
Type
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Detail
Non-exclusive ETD license
AssociatedObject (AUTHORITY = rulib); (ID = 1)
Type
License
Name
Author Agreement License
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I hereby grant to the Rutgers University Libraries and to my school the non-exclusive right to archive, reproduce and distribute my thesis or dissertation, in whole or in part, and/or my abstract, in whole or in part, in and from an electronic format, subject to the release date subsequently stipulated in this submittal form and approved by my school. I represent and stipulate that the thesis or dissertation and its abstract are my original work, that they do not infringe or violate any rights of others, and that I make these grants as the sole owner of the rights to my thesis or dissertation and its abstract. I represent that I have obtained written permissions, when necessary, from the owner(s) of each third party copyrighted matter to be included in my thesis or dissertation and will supply copies of such upon request by my school. I acknowledge that RU ETD and my school will not distribute my thesis or dissertation or its abstract if, in their reasonable judgment, they believe all such rights have not been secured. I acknowledge that I retain ownership rights to the copyright of my work. I also retain the right to use all or part of this thesis or dissertation in future works, such as articles or books.
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Format (TYPE = mime); (VERSION = )
application/x-tar
FileSize (UNIT = bytes)
4405760
Checksum (METHOD = SHA1)
183c1820891f88580effda7bb2e20c9dc3b2d939
ContentModel
ETD
CompressionScheme
other
OperatingSystem (VERSION = 5.1)
windows xp
Format (TYPE = mime); (VERSION = NULL)
application/x-tar
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