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Photo-assisted wet (PAW) etching for laser fabrication

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TypeOfResource
Text
TitleInfo (ID = T-1)
Title
Photo-assisted wet (PAW) etching for laser fabrication
Identifier
ETD_1763
Identifier (type = hdl)
http://hdl.rutgers.edu/1782.2/rucore10001600001.ETD.000051427
Language
LanguageTerm (authority = ISO639-2); (type = code)
eng
Genre (authority = marcgt)
theses
Subject (ID = SBJ-1); (authority = RUETD)
Topic
Electrical and Computer Engineering
Subject (ID = SBJ-1); (authority = ETD-LCSH)
Topic
Lasers
Subject (ID = SBJ-1); (authority = ETD-LCSH)
Topic
Optoelectronic devices
Subject (ID = SBJ-1); (authority = ETD-LCSH)
Topic
Photonics
Abstract
Modern day technology uses discrete optical components including laser diodes and integrated electronic circuits. Fabricating an etched mirror laser is one of the major tasks to realize integrated optics. While dry etching is the most widely accepted process to fabricate optoelectronic devices, wet etching has potential advantages including lower cost, smoother surfaces, and faster etching rate. However typical wet etching does not provide a viable alternative for the demanding process of fabricating vertical side walls with low lateral etch rates. The application of the wet etching to the production of vertical sidewalls has been a significant problem for several decades.
The primary accomplishments of the research consists of developing processes, apparatus, and models for the Photo-Assisted Wet (PAW) etching that uses light directed perpendicular to the surface of a wafer in order to alter the typical crystal-plane etching and thereby control the sidewall profile. The new techniques demonstrate integrated laser mirrors in III-V laser heterostructure. These mirrors achieve as high as 93% of the reflectance of the cleaved mirror with negligible dependence on the crystal orientation.
The research explores the PAW etching process using both coherent (lasers) and incoherent (LEDs) illumination for different types of materials including bulk GaAs and III-V laser heterostructure. The effects of different wavelengths, intensities and wafer masking structures are investigated. Specific combinations control the sidewall profile and etching characteristics to produce on-demand etch-stop layers and sidewall angles ranging from 0 to 90o. Laser heterostructure etched with coherent illumination shows unexpected results for heterostructure including non-uniform etch depth linked to the masking materials and surface density of excess carriers.
New apparatus was designed and applied to the PAW etching for the fabrication of III-V devices. The apparatus has in-situ, real-time systems including (i) an optical system to expand, filter and dither the etching beam, (ii) a pulsed-laser wet etch monitor to determine the etch depth, rate, formation of surface microstructure and transition layers in a preselected region of the sample (iii) a steady-state photoluminescence (PL) monitor with CCD array and Photo Detector (PD) to provide (2-D) spatially-resolved and integrated measurements of PL during the etching.
PhysicalDescription
Form (authority = gmd)
electronic resource
Extent
xxv, 265 p. : ill.
InternetMediaType
application/pdf
InternetMediaType
text/xml
Note (type = degree)
Ph.D.
Note (type = bibliography)
Includes bibliographical references (p. 256-264)
Note (type = statement of responsibility)
by Eun-Hyeong Yi
Name (ID = NAME-1); (type = personal)
NamePart (type = family)
Yi
NamePart (type = given)
Eun-Hyeong
NamePart (type = date)
1974
Role
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author
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Eun-Hyeong Yi
Name (ID = NAME-2); (type = personal)
NamePart (type = family)
Parker
NamePart (type = given)
Michael
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chair
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Advisory Committee
DisplayForm
Michael A Parker
Name (ID = NAME-3); (type = personal)
NamePart (type = family)
McAfee
NamePart (type = given)
Sigrid
Role
RoleTerm (authority = RULIB); (type = )
internal member
Affiliation
Advisory Committee
DisplayForm
Sigrid R McAfee
Name (ID = NAME-4); (type = personal)
NamePart (type = family)
Caggiano
NamePart (type = given)
Michael
Role
RoleTerm (authority = RULIB); (type = )
internal member
Affiliation
Advisory Committee
DisplayForm
Michael Caggiano
Name (ID = NAME-5); (type = personal)
NamePart (type = family)
Lu
NamePart (type = given)
Yicheng
Role
RoleTerm (authority = RULIB); (type = )
internal member
Affiliation
Advisory Committee
DisplayForm
Yicheng Lu
Name (ID = NAME-6); (type = personal)
NamePart (type = family)
Sigel
NamePart (type = given)
George
Role
RoleTerm (authority = RULIB); (type = )
outside member
Affiliation
Advisory Committee
DisplayForm
George H Sigel
Name (ID = NAME-1); (type = corporate)
NamePart
Rutgers University
Role
RoleTerm (authority = RULIB); (type = )
degree grantor
Name (ID = NAME-2); (type = corporate)
NamePart
Graduate School - New Brunswick
Role
RoleTerm (authority = RULIB); (type = )
school
OriginInfo
DateCreated (point = ); (qualifier = exact)
2009
DateOther (qualifier = exact); (type = degree)
2009-05
Place
PlaceTerm (type = code)
xx
RelatedItem (type = host)
TitleInfo
Title
Rutgers University Electronic Theses and Dissertations
Identifier (type = RULIB)
ETD
RelatedItem (type = host)
TitleInfo
Title
Graduate School - New Brunswick Electronic Theses and Dissertations
Identifier (type = local)
rucore19991600001
Location
PhysicalLocation (authority = marcorg); (displayLabel = Rutgers, The State University of New Jersey)
NjNbRU
Identifier (type = doi)
doi:10.7282/T38K799V
Genre (authority = ExL-Esploro)
ETD doctoral
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The author owns the copyright to this work.
Copyright
Status
Copyright protected
Availability
Status
Open
RightsEvent (AUTHORITY = rulib); (ID = 1)
Type
Permission or license
Detail
Non-exclusive ETD license
AssociatedObject (AUTHORITY = rulib); (ID = 1)
Type
License
Name
Author Agreement License
Detail
I hereby grant to the Rutgers University Libraries and to my school the non-exclusive right to archive, reproduce and distribute my thesis or dissertation, in whole or in part, and/or my abstract, in whole or in part, in and from an electronic format, subject to the release date subsequently stipulated in this submittal form and approved by my school. I represent and stipulate that the thesis or dissertation and its abstract are my original work, that they do not infringe or violate any rights of others, and that I make these grants as the sole owner of the rights to my thesis or dissertation and its abstract. I represent that I have obtained written permissions, when necessary, from the owner(s) of each third party copyrighted matter to be included in my thesis or dissertation and will supply copies of such upon request by my school. I acknowledge that RU ETD and my school will not distribute my thesis or dissertation or its abstract if, in their reasonable judgment, they believe all such rights have not been secured. I acknowledge that I retain ownership rights to the copyright of my work. I also retain the right to use all or part of this thesis or dissertation in future works, such as articles or books.
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Technical

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ETD
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application/pdf
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application/x-tar
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