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Metallic quantum well states and chemisorption
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Metallic quantum well states and chemisorption
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ETD_2024
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http://hdl.rutgers.edu/1782.2/rucore10001600001.ETD.000051915
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eng
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theses
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Physics and Astronomy
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(authority = ETD-LCSH)
Topic
Quantum wells
Subject
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(authority = ETD-LCSH)
Topic
Chemisorption
Abstract
In this thesis the adsorption properties of carbon monoxide (CO) on the epitaxial fcc-Co/Cu(100), Ni/Cu (100) and Cu/fcc-Fe/Cu(100) systems are reported.
The fcc-Co/Cu(100), Ni/Cu(100) systems are known to exhibit metallic quantum well (MQW) states at energies 1 eV or greater above the Fermi level, that disperse upward with increasing film thickness, but never cross the Fermi level and are less pronounced than MQW features in Cu/fcc-Fe/Cu(100) system. The presence of quantum size effects in electronic structure of these systems gives a possibility to modify molecule-surface interactions and influence CO adsorption. All these systems were explored with low energy electron diffraction (LEED), inverse photoemission (IPE), infrared absorption (FTIR) Spectroscopy and temperature programmed desorption (TPD).
TPD measurements revealed several desorption features upon CO adsorption on The fcc-Co/Cu(100), Ni/Cu(100) systems. These TPD features are linked
to the corresponding modes in IR spectra and suggest a range of bonding configurations at Co and Ni surfaces. The analysis of TPD and FTIR spectra are given. The adsorption properties of these thin film surfaces are compared to those of single crystal hcp-Co and Ni(100).
For increasing thickness of Cu on the fcc-Fe/Cu system, MQW states periodically cross and modulate IPE intensity at Fermi level. Changes in the peak temperature of TPD spectra are correlated with these modulations of IPE intensity. IR shows two features in the CO stretch frequency spectra, which are identified as CO adsorbed on terrace sites and at step sites. The IR results also suggest a correlation between intensities of these two spectral features and MQW states crossing the Fermi level.
The results of measurements done on the dimethyl disulfide (DMDS) molecule adsorbed on the Cu/fcc-Fe/Cu(100) MQW system is also reported. DMDS is
a simple example of an organic thiol, a class of molecules that exhibit self-assembly properties on metal surfaces. The measurements suggest possible modifications of molecular adsorption on the Cu surface. Similarities and differences of DMDS molecule adsorption on thin film Cu(100) and single crystal Cu(100) will be discussed.
The fcc-Co/Cu(100), Ni/Cu(100) systems are known to exhibit metallic quantum well (MQW) states at energies 1 eV or greater above the Fermi level, that disperse upward with increasing film thickness, but never cross the Fermi level and are less pronounced than MQW features in Cu/fcc-Fe/Cu(100) system. The presence of quantum size effects in electronic structure of these systems gives a possibility to modify molecule-surface interactions and influence CO adsorption. All these systems were explored with low energy electron diffraction (LEED), inverse photoemission (IPE), infrared absorption (FTIR) Spectroscopy and temperature programmed desorption (TPD).
TPD measurements revealed several desorption features upon CO adsorption on The fcc-Co/Cu(100), Ni/Cu(100) systems. These TPD features are linked
to the corresponding modes in IR spectra and suggest a range of bonding configurations at Co and Ni surfaces. The analysis of TPD and FTIR spectra are given. The adsorption properties of these thin film surfaces are compared to those of single crystal hcp-Co and Ni(100).
For increasing thickness of Cu on the fcc-Fe/Cu system, MQW states periodically cross and modulate IPE intensity at Fermi level. Changes in the peak temperature of TPD spectra are correlated with these modulations of IPE intensity. IR shows two features in the CO stretch frequency spectra, which are identified as CO adsorbed on terrace sites and at step sites. The IR results also suggest a correlation between intensities of these two spectral features and MQW states crossing the Fermi level.
The results of measurements done on the dimethyl disulfide (DMDS) molecule adsorbed on the Cu/fcc-Fe/Cu(100) MQW system is also reported. DMDS is
a simple example of an organic thiol, a class of molecules that exhibit self-assembly properties on metal surfaces. The measurements suggest possible modifications of molecular adsorption on the Cu surface. Similarities and differences of DMDS molecule adsorption on thin film Cu(100) and single crystal Cu(100) will be discussed.
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electronic resource
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xii, 130 p. : ill.
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Ph.D.
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Includes bibliographical references (p. 123-130)
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by Levan Tskipuri
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Tskipuri
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Levan
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1978-
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Levan Tskipuri
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Bartynski
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Robert
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chair
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Robert A. Bartynski
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Andrei
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Eva
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internal member
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Eva Y. Andrei
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Gilman
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Ronald
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Ronald Gilman
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Vescovo
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Elio
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Elio Vescovo
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Rutgers University
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Graduate School - New Brunswick
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2009
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2009-10
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xx
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Rutgers University Electronic Theses and Dissertations
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ETD
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Graduate School - New Brunswick Electronic Theses and Dissertations
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doi:10.7282/T3RN381C
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ETD doctoral
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The author owns the copyright to this work
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Copyright protected
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Open
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Tskipuri
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Levan
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Levan Tskipuri
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Rutgers University. Graduate School - New Brunswick
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I hereby grant to the Rutgers University Libraries and to my school the non-exclusive right to archive, reproduce and distribute my thesis or dissertation, in whole or in part, and/or my abstract, in whole or in part, in and from an electronic format, subject to the release date subsequently stipulated in this submittal form and approved by my school. I represent and stipulate that the thesis or dissertation and its abstract are my original work, that they do not infringe or violate any rights of others, and that I make these grants as the sole owner of the rights to my thesis or dissertation and its abstract. I represent that I have obtained written permissions, when necessary, from the owner(s) of each third party copyrighted matter to be included in my thesis or dissertation and will supply copies of such upon request by my school. I acknowledge that RU ETD and my school will not distribute my thesis or dissertation or its abstract if, in their reasonable judgment, they believe all such rights have not been secured. I acknowledge that I retain ownership rights to the copyright of my work. I also retain the right to use all or part of this thesis or dissertation in future works, such as articles or books.
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