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Surface and thin film studies of the etching of molybdenum by xenon difluoride

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TypeOfResource
Text
TitleInfo (ID = T-1)
Title
Surface and thin film studies of the etching of molybdenum by xenon difluoride
Identifier
ETD_2542
Identifier (type = hdl)
http://hdl.rutgers.edu/1782.1/rucore10001600001.ETD.000053493
Language
LanguageTerm (authority = ISO639-2); (type = code)
eng
Genre (authority = marcgt)
theses
Subject (ID = SBJ-1); (authority = RUETD)
Topic
Chemistry and Chemical Biology
Subject (ID = SBJ-2); (authority = ETD-LCSH)
Topic
Thin films
Subject (ID = SBJ-3); (authority = ETD-LCSH)
Topic
Molybdenum
Subject (ID = SBJ-4); (authority = ETD-LCSH)
Topic
Plasma etching
Subject (ID = SBJ-5); (authority = ETD-LCSH)
Topic
X-ray photoelectron spectroscopy
Subject (ID = SBJ-6); (authority = ETD-LCSH)
Topic
Surfaces (Technology)--Analysis
Abstract (type = abstract)
The controlled etching of micro/nano structures is essential for a variety of technological applications, including microelectromechanical systems (MEMS) fabrication. XeF2 is an isotropic and highly selective etching gas used to remove semiconductors (such as Si, Ge) and metals (such as Mo, W) in the fabrication of MEMS and other devices. While the kinetics of XeF2 etching of Si has been widely documented, XeF2 etching of metals is not widely understood. For better process control and device quality, it is important to understand the etching mechanism at the molecular level. In this work, we explore the surface and gas phase chemistry of XeF2 etching of metallic films, focusing on Mo. Studies of the general characteristics of XeF2 etching of Mo blanket films at different sample temperatures and etchant pressures were carried on 1000ÅMo/475ÅSiO2/100ÅNi/glass samples in a standalone etching chamber, then they were analyzed ex-situ by multiple surface sensitive tools. Atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS) were used for chemical and morphological analysis of the etched surfaces. Rutherford back scattering (RBS) and medium energy ion scattering (MEIS) were used to measure the thickness of the films and the depth profile of near-surface species after etching. Mo is etched by XeF2 rapidly and selectively. XPS, AFM, and RBS data on the morphology and composition of surfaces after etching at different temperatures and pressures is presented. Data showing how the condition of the surface prior to etching (initial surface) affects the initiation and progress of etching is also discussed. The composition and chemical state of the etched surface (reaction layer) is further investigated by in-vacuo etching and XPS analysis experiments using 3750ÅMo/quartz samples in an integrated etching/analysis system. The XPS studies have clarified issues on the thickness and chemical composition of the reaction layer during etching. The effects of the surface native oxides and adventitious hydrocarbons on etching and re-deposition of etched products were also examined by in-vacuo etching and XPS. Post etching thermal processing and XPS analysis studies were performed to investigate the chemical composition of residues left after etching. These studies have indicated that after etching there are physisorbed and chemisorbed fluorine species that desorb at different temperatures. Downstream mass spectrometry was used to identify the gas phase by-products of the etching process. Since etching is non-uniform and the initial condition of the surface affects the etching process, using time dependencies vs. etched thicknesses is shown to be an unreliable method to measure the rate of etching. Thus, alternative methods, including the total pressure change and a quartz crystal micro balance (QCM), were used to calculate the rate of etching of blanket Mo films. Under the conditions reported here, the rates of etching of blanket films were determined to be 60-75 nm/sec at 25- 90 °C. The order of reaction is close to one. The rate of undercut etching, measured on patterned samples, changes significantly (0.5-2.5 µ/min) under different conditions, depending on the etching method, temperature, and pattern size. Mask deformation is observed on certain shapes. Different gas delivery methods were tested and their efficiency is discussed. Both on etching of patterned and blanket films, pulsing of the etchant gas is shown to be a more efficient method for etching than static etching.
PhysicalDescription
Form (authority = gmd)
electronic resource
Extent
xii, 183 p. : ill.
InternetMediaType
application/pdf
InternetMediaType
text/xml
Note (type = degree)
Ph.D.
Note
Includes abstract
Note
Vita
Note (type = bibliography)
Includes bibliographical references
Note (type = statement of responsibility)
by Özgür Çelík
Name (ID = NAME-1); (type = personal)
NamePart (type = family)
Çelík
NamePart (type = given)
Özgür
NamePart (type = date)
1977-
Role
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author
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Ozgur Celik
Name (ID = NAME-2); (type = personal)
NamePart (type = family)
Garfunkel
NamePart (type = given)
Eric L
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chair
Affiliation
Advisory Committee
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Eric L Garfunkel
Name (ID = NAME-3); (type = personal)
NamePart (type = family)
Hinch
NamePart (type = given)
Jane
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internal member
Affiliation
Advisory Committee
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Jane Hinch
Name (ID = NAME-4); (type = personal)
NamePart (type = family)
Asefa
NamePart (type = given)
Tewodros
Role
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internal member
Affiliation
Advisory Committee
DisplayForm
Tewodros Asefa
Name (ID = NAME-5); (type = personal)
NamePart (type = family)
Bartynski
NamePart (type = given)
Robert
Role
RoleTerm (authority = RULIB)
outside member
Affiliation
Advisory Committee
DisplayForm
Robert Bartynski
Name (ID = NAME-1); (type = corporate)
NamePart
Rutgers University
Role
RoleTerm (authority = RULIB)
degree grantor
Name (ID = NAME-2); (type = corporate)
NamePart
Graduate School - New Brunswick
Role
RoleTerm (authority = RULIB)
school
OriginInfo
DateCreated (qualifier = exact)
2010
DateOther (qualifier = exact); (type = degree)
2010
Place
PlaceTerm (type = code)
xx
RelatedItem (type = host)
TitleInfo
Title
Rutgers University Electronic Theses and Dissertations
Identifier (type = RULIB)
ETD
RelatedItem (type = host)
TitleInfo
Title
Graduate School - New Brunswick Electronic Theses and Dissertations
Identifier (type = local)
rucore19991600001
Location
PhysicalLocation (authority = marcorg); (displayLabel = Rutgers, The State University of New Jersey)
NjNbRU
Identifier (type = doi)
doi:10.7282/T3PZ58WT
Genre (authority = ExL-Esploro)
ETD doctoral
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The author owns the copyright to this work.
Copyright
Status
Copyright protected
Availability
Status
Open
Reason
Permission or license
RightsHolder (ID = PRH-1); (type = personal)
Name
FamilyName
Celik
GivenName
Ozgur
Role
Copyright Holder
RightsEvent (ID = RE-1); (AUTHORITY = rulib)
Type
Permission or license
DateTime
2010-04-07 12:38:05
AssociatedEntity (ID = AE-1); (AUTHORITY = rulib)
Role
Copyright holder
Name
Ozgur Celik
Affiliation
Rutgers University. Graduate School - New Brunswick
AssociatedObject (ID = AO-1); (AUTHORITY = rulib)
Type
License
Name
Author Agreement License
Detail
I hereby grant to the Rutgers University Libraries and to my school the non-exclusive right to archive, reproduce and distribute my thesis or dissertation, in whole or in part, and/or my abstract, in whole or in part, in and from an electronic format, subject to the release date subsequently stipulated in this submittal form and approved by my school. I represent and stipulate that the thesis or dissertation and its abstract are my original work, that they do not infringe or violate any rights of others, and that I make these grants as the sole owner of the rights to my thesis or dissertation and its abstract. I represent that I have obtained written permissions, when necessary, from the owner(s) of each third party copyrighted matter to be included in my thesis or dissertation and will supply copies of such upon request by my school. I acknowledge that RU ETD and my school will not distribute my thesis or dissertation or its abstract if, in their reasonable judgment, they believe all such rights have not been secured. I acknowledge that I retain ownership rights to the copyright of my work. I also retain the right to use all or part of this thesis or dissertation in future works, such as articles or books.
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ETD
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application/pdf
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application/x-tar
FileSize (UNIT = bytes)
4536320
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