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Micropatterned Charge Heterogeneities via Vapor Deposition of Aminosilanes

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TypeOfResource
Text
TitleInfo
Title
Micropatterned Charge Heterogeneities via Vapor Deposition of Aminosilanes
Name (type = personal)
NamePart (type = family)
Pick
NamePart (type = given)
Christian
Role
RoleTerm (authority = marcrt); (type = text)
author
Affiliation
Johns Hopkins University
Name (type = personal)
NamePart (type = family)
Argento
NamePart (type = given)
Christopher
Role
RoleTerm (authority = marcrt); (type = text)
author
Affiliation
Johns Hopkins University
Name (authority = orcid); (authorityURI = http://id.loc.gov/vocabulary/identifiers/orcid.html); (type = personal); (valueURI = http://orcid.org/0000-0003-3860-7329)
NamePart (type = family)
Drazer
NamePart (type = given)
German
Affiliation
Mechanical and Aerospace Engineering, Rutgers University
Role
RoleTerm (authority = marcrt); (type = text)
author
Name (type = personal)
NamePart (type = family)
Frechette
NamePart (type = given)
Joelle
Role
RoleTerm (authority = marcrt); (type = text)
author
Affiliation
Johns Hopkins University
Name (authority = RutgersOrg-Department); (type = corporate)
NamePart
Mechanical and Aerospace Engineering
Name (authority = RutgersOrg-School); (type = corporate)
NamePart
School of Engineering
Genre (authority = RULIB-FS)
Article, Refereed
Genre (authority = NISO JAV)
Accepted Manuscript (AM)
OriginInfo
Publisher
ACS
DateIssued (encoding = w3cdtf); (keyDate = yes); (qualifier = exact)
2015
Abstract (type = Abstract)
Aminosilanes are routinely employed for charge reversal or to create coupling layers on oxide surfaces. We present a chemical vapor deposition method to pattern mica surfaces with regions of high-quality aminosilane (3-aminopropyltriethoxysilane, APTES) monolayers. The approach relies on the vapor deposition of an aminosilane through a patterned array of through-holes in a PDMS (poly(dimethylsiloxane)) membrane that acts as a mask. In aqueous solutions the surfaces have regular patterns of charge heterogeneities with minimal topographical variations over large areas. This versatile dry lift-off deposition method alleviates issues with multilayer formation and can be used to create charge patterns on curved surfaces. We identify the necessary steps to achieve high quality monolayers and charge reversal of the underlying mica surface: 1) hexane extraction to remove unreacted PDMS oligomers from the membrane that would otherwise deposit on and contaminate the substrate, 2) oxygen plasma treatment of the top of the membrane surfaces to generate a barrier layer that blocks APTES transport through the PDMS, and 3) decrease of the vapor pressure of APTES during deposition to minimize APTES condensation at the mica–membrane-vapor contact lines and to prevent multilayer formation. Under these conditions, AFM imaging shows that the monolayers have a height of (0.9 ± 0.2) nm with an increase in height up to 3nm at the mica–membrane-vapor contact lines. Fluorescence imaging demonstrates pattern fidelity on both flat and curved surfaces, for feature sizes that vary between 6.5-40 μm. We verify charge reversal by measuring the double layer forces between a homogeneous (unpatterned) APTES monolayers and a mica surface in aqueous solution and we characterize the surface potential of APTES monolayers by measuring the double layer forces between identical APTES surfaces. We obtain a surface potential of +110mV +/- 6 mV at pH 4.0.
Language
LanguageTerm (authority = ISO 639-3:2007); (type = text)
English
PhysicalDescription
InternetMediaType
application/pdf
Extent
19 p.
Extension
DescriptiveEvent
Type
Citation
DateTime (encoding = w3cdtf)
2015
AssociatedObject
Name
Langmuir
Type
Journal
Relationship
Has part
Detail
10725-10733
Identifier (type = volume and issue)
31(39)
Reference (type = url)
https://dx.doi.org/10.1021/acs.langmuir.5b02771
Extension
DescriptiveEvent
Type
Grant award
AssociatedEntity
Role
Funder
Name
National Science Foundation
AssociatedEntity
Role
Originator
Name
German Drazer
AssociatedEntity
Role
Originator
Name
Joelle Frechette
AssociatedObject
Type
Grant number
Name
NSF-CBET ENV 1436482
RelatedItem (type = host)
TitleInfo
Title
Drazer, German
Identifier (type = local)
rucore30143000001
Location
PhysicalLocation (authority = marcorg); (displayLabel = Rutgers, The State University of New Jersey)
NjNbRU
Identifier (type = doi)
doi:10.7282/T34X59QP
Note (type = version identification)
This document is the Accepted Manuscript version of a Published Work that appeared in final form in Langmuir, copyright © American Chemical Society after peer review. To access the final edited and published work see http://pubs.acs.org/doi/10.1021/acs.langmuir.5b02771.
Note (type = peerReview)
Peer reviewed
Genre (authority = ExL-Esploro)
Accepted Manuscript
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Rights

RightsDeclaration (AUTHORITY = FS); (ID = rulibRdec0004)
Copyright for scholarly resources published in RUcore is retained by the copyright holder. By virtue of its appearance in this open access medium, you are free to use this resource, with proper attribution, in educational and other non-commercial settings. Other uses, such as reproduction or republication, may require the permission of the copyright holder.
Copyright
Status
Copyright protected
Availability
Status
Open
Reason
Permission or license
RightsEvent
Type
Permission or license
AssociatedObject
Type
License
Name
Multiple author license v. 1
Detail
I hereby grant to Rutgers, The State University of New Jersey (Rutgers) the non-exclusive right to retain, reproduce, and distribute the deposited work (Work) in whole or in part, in and from its electronic format, without fee. This agreement does not represent a transfer of copyright to Rutgers.Rutgers may make and keep more than one copy of the Work for purposes of security, backup, preservation, and access and may migrate the Work to any medium or format for the purpose of preservation and access in the future. Rutgers will not make any alteration, other than as allowed by this agreement, to the Work.I represent and warrant to Rutgers that the Work is my original work. I also represent that the Work does not, to the best of my knowledge, infringe or violate any rights of others.I further represent and warrant that I have obtained all necessary rights to permit Rutgers to reproduce and distribute the Work and that any third-party owned content is clearly identified and acknowledged within the Work.By granting this license, I acknowledge that I have read and agreed to the terms of this agreement and all related RUcore and Rutgers policies.
RightsEvent
Type
Embargo
DateTime (encoding = w3cdtf); (point = end); (qualifier = exact); (keyDate = no)
2016-09-11
DateTime (encoding = w3cdtf); (point = start); (qualifier = exact); (keyDate = no)
2015-12-02
Detail
Access to this PDF has been restricted at the publisher's request.The publisher, ACS Publications, requires a 12 month embargo from the date the article was published. The article in this repository will be publicly available after September 11, 2016.
RightsHolder (type = corporate)
Name
American Chemical Society
Role
Copyright holder
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Technical

RULTechMD (ID = TECHNICAL1)
ContentModel
Document
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