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Pulsed light sintering of nanomaterial interconnects embedded inside molded PDMS

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TitleInfo
Title
Pulsed light sintering of nanomaterial interconnects embedded inside molded PDMS
Name (type = personal)
NamePart (type = family)
Joshi
NamePart (type = given)
Mukund Rajeev
NamePart (type = date)
1993-
DisplayForm
Mukund Rajeev Joshi
Role
RoleTerm (authority = RULIB)
author
Name (type = personal)
NamePart (type = family)
Malhotra
NamePart (type = given)
Rajiv
DisplayForm
Rajiv Malhotra
Affiliation
Advisory Committee
Role
RoleTerm (authority = RULIB)
chair
Name (type = personal)
NamePart (type = family)
Pelegri
NamePart (type = given)
ASSIMINA
DisplayForm
ASSIMINA Pelegri
Affiliation
Advisory Committee
Role
RoleTerm (authority = RULIB)
internal member
Name (type = personal)
NamePart (type = family)
Mazzeo
NamePart (type = given)
Aaron
DisplayForm
Aaron Mazzeo
Affiliation
Advisory Committee
Role
RoleTerm (authority = RULIB)
internal member
Name (type = corporate)
NamePart
Rutgers University
Role
RoleTerm (authority = RULIB)
degree grantor
Name (type = corporate)
NamePart
School of Graduate Studies
Role
RoleTerm (authority = RULIB)
school
TypeOfResource
Text
Genre (authority = marcgt)
theses
OriginInfo
DateCreated (encoding = w3cdtf); (keyDate = yes); (qualifier = exact)
2019
DateOther (encoding = w3cdtf); (qualifier = exact); (type = degree)
2019-05
CopyrightDate (encoding = w3cdtf); (qualifier = exact)
2019
Language
LanguageTerm (authority = ISO 639-3:2007); (type = text)
English
Abstract
The need for flexible interconnects embedded inside elastomers is on the rise since the past few decades. This research explores how Intense Pulsed Light (IPL) sintering of interconnects consisting of Ag nanoflake-nanowire mixtures inside PDMS affects the electrical resistivity of the interconnect. Aerosol Jet Printing (AJP) was used to print the nanomaterial onto flexible PDMS substrates. The nanomaterial was encased by molding another layer of PDMS on top of it. IPL sintering was performed on the interconnect before and after molding the top PDMS layer, in two separate approaches. The IPL parameters and the nanoflake-nanowire ratio were varied to study their effect on sample quality. The fabricated samples were subjected to cyclic bending tests up to 1000 cycles. It is shown that there is an optimal fabrication route, with optimal IPL parameters and nanoflake-nanowire ratio that allows resistivity of around 9.75 - 11 µΩ-cm, with low hysteresis over 1000 cycles.
Subject (authority = local)
Topic
IPL
Subject (authority = RUETD)
Topic
Mechanical and Aerospace Engineering
Subject (authority = LCSH)
Topic
Polydimethylsiloxane
Subject (authority = LCSH)
Topic
Photonic sintering
Subject (authority = LCSH)
Topic
Flexible electronics
RelatedItem (type = host)
TitleInfo
Title
Rutgers University Electronic Theses and Dissertations
Identifier (type = RULIB)
ETD
Identifier
ETD_9839
PhysicalDescription
Form (authority = gmd)
InternetMediaType
application/pdf
InternetMediaType
text/xml
Extent
1 online resource (viii, 74 pages) : illustrations
Note (type = degree)
M.S.
Note (type = bibliography)
Includes bibliographical references
RelatedItem (type = host)
TitleInfo
Title
School of Graduate Studies Electronic Theses and Dissertations
Identifier (type = local)
rucore10001600001
Location
PhysicalLocation (authority = marcorg); (displayLabel = Rutgers, The State University of New Jersey)
NjNbRU
Identifier (type = doi)
doi:10.7282/t3-6khf-zf12
Genre (authority = ExL-Esploro)
ETD graduate
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Rights

RightsDeclaration (ID = rulibRdec0006)
The author owns the copyright to this work.
RightsHolder (type = personal)
Name
FamilyName
Joshi
GivenName
Mukund
MiddleName
Rajeev
Role
Copyright Holder
RightsEvent
Type
Permission or license
DateTime (encoding = w3cdtf); (qualifier = exact); (point = start)
2019-04-12 12:49:49
AssociatedEntity
Name
Mukund Joshi
Role
Copyright holder
Affiliation
Rutgers University. School of Graduate Studies
AssociatedObject
Type
License
Name
Author Agreement License
Detail
I hereby grant to the Rutgers University Libraries and to my school the non-exclusive right to archive, reproduce and distribute my thesis or dissertation, in whole or in part, and/or my abstract, in whole or in part, in and from an electronic format, subject to the release date subsequently stipulated in this submittal form and approved by my school. I represent and stipulate that the thesis or dissertation and its abstract are my original work, that they do not infringe or violate any rights of others, and that I make these grants as the sole owner of the rights to my thesis or dissertation and its abstract. I represent that I have obtained written permissions, when necessary, from the owner(s) of each third party copyrighted matter to be included in my thesis or dissertation and will supply copies of such upon request by my school. I acknowledge that RU ETD and my school will not distribute my thesis or dissertation or its abstract if, in their reasonable judgment, they believe all such rights have not been secured. I acknowledge that I retain ownership rights to the copyright of my work. I also retain the right to use all or part of this thesis or dissertation in future works, such as articles or books.
Copyright
Status
Copyright protected
Availability
Status
Open
Reason
Permission or license
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Technical

RULTechMD (ID = TECHNICAL1)
ContentModel
ETD
OperatingSystem (VERSION = 5.1)
windows xp
CreatingApplication
Version
1.7
ApplicationName
Microsoft® Word for Office 365
DateCreated (point = end); (encoding = w3cdtf); (qualifier = exact)
2019-04-25T11:31:43
DateCreated (point = end); (encoding = w3cdtf); (qualifier = exact)
2019-04-25T11:31:43
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