LanguageTerm (authority = ISO 639-3:2007); (type = text)
English
Abstract
The need for flexible interconnects embedded inside elastomers is on the rise since the past few decades. This research explores how Intense Pulsed Light (IPL) sintering of interconnects consisting of Ag nanoflake-nanowire mixtures inside PDMS affects the electrical resistivity of the interconnect. Aerosol Jet Printing (AJP) was used to print the nanomaterial onto flexible PDMS substrates. The nanomaterial was encased by molding another layer of PDMS on top of it. IPL sintering was performed on the interconnect before and after molding the top PDMS layer, in two separate approaches. The IPL parameters and the nanoflake-nanowire ratio were varied to study their effect on sample quality. The fabricated samples were subjected to cyclic bending tests up to 1000 cycles. It is shown that there is an optimal fabrication route, with optimal IPL parameters and nanoflake-nanowire ratio that allows resistivity of around 9.75 - 11 µΩ-cm, with low hysteresis over 1000 cycles.
Subject (authority = local)
Topic
IPL
Subject (authority = RUETD)
Topic
Mechanical and Aerospace Engineering
Subject (authority = LCSH)
Topic
Polydimethylsiloxane
Subject (authority = LCSH)
Topic
Photonic sintering
Subject (authority = LCSH)
Topic
Flexible electronics
RelatedItem (type = host)
TitleInfo
Title
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